D. Lenoble

Optical Nonreciprocal Devices with a Silicon Guiding Layer Fabricated by Wafer Bonding

Synthesis of Cu, Zn and Cu/Zn brass alloy nanoparticles from metal amidinate precursors in ionic liquids or propylene carbonate with relevance to methanol synthesis

Copper–Zinc Alloy Nanopowder: A Robust Precious‐Metal‐Free Catalyst for the Conversion of 5‐Hydroxymethylfurfural

Halide Perovskite Photovoltaics: Background, Status, and Future Prospects

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

Copper‐Decorated Microsized Nanoporous Titanium Dioxide Photocatalysts for Carbon Dioxide Reduction by Water

Parity–time-symmetric whispering-gallery microcavities

Hydrothermally processed CuCrO₂ nanoparticles as an inorganic hole transporting material for low-cost perovskite solar cells with superior stability

Bosonic Anomalies in Boron-Doped Polycrystalline Diamond

Recent Advances in Electrocatalytic Hydrogen Evolution Using Nanoparticles

High-Efficiency Perovskite Solar Cells

Cocatalysts for Selective Photoreduction of CO₂into Solar Fuels

Superconductivity in doped semiconductors

Industrial Applications of Pulsed Power Technology

The Origin of Lower Hole Carrier Concentration in Methylammonium Tin Halide Films Grown by a Vapor-Assisted Solution Process

Advances in the deposition chemistry of metal-containing thin films using gas phase processes

Fabrication of N+/P ultra-shallow junctions by plasma doping for 65 nm CMOS technology

The fabrication of advanced transistors with plasma doping

Improvement of the photocatalytic degradation property of atomic layer deposited ZnO thin films: the interplay between film properties and functional performances

Atomic layer deposition of cobalt carbide films and their magnetic properties using propanol as a reducing agent

Silicon-on-Nothing (SON)-an innovative process for advanced CMOS

Formation of extremely shallow junctions for sub-90 nm devices

Transparent conductive CuCrO₂thin films deposited by pulsed injection metal organic chemical vapor deposition: up-scalable process technology for an improved transparency/conductivity trade-off

Ultra-shallow, super-doped and box-like junctions realized by laser-induced doping

Plasma doping for shallow junctions

Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agents