Citation Impact

Citing Papers

Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
2003 Standout
High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals
2012 Standout
Carrier-envelope phase stabilization of a multi-millijoule, regenerative-amplifier-based chirped-pulse smplifier dystem
2009 StandoutNobel
Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances
2012 Standout
Platinum single-atom and cluster catalysis of the hydrogen evolution reaction
2016 Standout
The ReaxFF reactive force-field: development, applications and future directions
2016 Standout
Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
2001
Chemistry and band offsets of HfO2 thin films for gate insulators
2003
Cubic/Tetragonal Phase Stabilization in High-κ ZrO2 Thin Films Grown Using O3-Based Atomic Layer Deposition
2011
Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits
2001
High dielectric constant oxides
2004 Standout
Atomic layer deposition of Al2O3 thin films using dimethylaluminum isopropoxide and water
2003
Physics of thin-film ferroelectric oxides
2005 Standout
Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO2 gate dielectric layers
2003
Composition, atomic transport, and chemical stability of ZrAlxOy ultrathin films deposited on Si(001)
2001
Raman scattering inHfxZr1−xO2nanoparticles
2005 StandoutNobel
Simulating the atomic layer deposition of alumina from first principles
2004
Atomic Layer Deposition of Al[sub 2]O[sub 3] Thin Films Using Trimethylaluminum and Isopropyl Alcohol
2002
Integrity of hafnium silicate/silicon dioxide ultrathin films on Si
2002
Atomic Layer Deposition Functionalized Composite SOFC Cathode La0.6Sr0.4Fe0.8Co0.2O3-δ -Gd0.2Ce0.8O1.9: Enhanced Long-Term Stability
2013 StandoutNobel
Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy
2004
Fundamentals, processes and applications of high-permittivity polymer–matrix composites
2011 Standout
Solid-Solution Nanoparticles:  Use of a Nonhydrolytic Sol−Gel Synthesis To Prepare HfO2 and HfxZr1-xO2 Nanocrystals
2004 StandoutNobel
Electronic properties of zircon and hafnon from many-body perturbation theory
2009
Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O
2002
Materials Characterization of Alternative Gate Dielectrics
2002
Atomic Layer Deposition: An Overview
2009 Standout
High temperature stability of Al2O3 dielectrics on Si: Interfacial metal diffusion and mobility degradation
2002
Homogeneous/Inhomogeneous‐Structured Dielectrics and their Energy‐Storage Performances
2017 Standout
Metal Organic Atomic Layer Deposition of High-k Gate Dielectrics Using Plasma Oxidation
2003
Alternative dielectrics to silicon dioxide for memory and logic devices
2000 Nature
Localized Surface Plasmon Resonance Spectroscopy and Sensing
2006 Standout
Nucleation and interface formation mechanisms in atomic layer deposition of gate oxides
2003
Characterization of silicate/Si(001) interfaces
2002
Suppression of subcutaneous oxidation during the deposition of amorphous lanthanum aluminate on silicon
2004
Reaction mechanism studies on the zirconium chloride–water atomic layer deposition process
2002
ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3)2 and Water as Precursors
2003
Flexible Nanodielectric Materials with High Permittivity for Power Energy Storage
2013 Standout
Boron penetration studies from p+ polycrystalline Si through HfSixOy
2002
Modelling the Deposition of High-k Dielectric Films by First Principles
2004
Reaction Mechanism Studies on the Atomic Layer Deposition of ZrxTiyOz Using the Novel Metal Halide−Metal Alkoxide Approach
2002
Electrostatic potential perturbation at the polycrystalline Si∕HfO2 interface
2005
Recent Progress on Ferroelectric Polymer-Based Nanocomposites for High Energy Density Capacitors: Synthesis, Dielectric Properties, and Future Aspects
2016 Standout
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
Atomic layer deposition of hafnium silicate films using hafnium tetrachloride and tetra-n-butyl orthosilicate
2004
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Low dielectric constant materials for microelectronics
2003 Standout
Atomic layer deposition of zirconium silicate films using zirconium tetrachloride and tetra-n-butyl orthosilicate
2002
Maximally localized Wannier functions: Theory and applications
2012 Standout
High-k/Ge MOSFETs for future nanoelectronics
2008
Effective Surface Passivation by Novel $\hbox{SiH}_{4}$ –$\hbox{NH}_{3}$ Treatment and BTI Characteristics on Interface-Engineered High-Mobility $\hbox{HfO}_{2}$-Gated Ge pMOSFETs
2010
Interfacial oxide formation and oxygen diffusion in rare earth oxide–silicon epitaxial heterostructures
2002
Al2O3 Nanotubes Fabricated by Wet Etching of ZnO/Al2O3 Core/Shell Nanofibers
2004
In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water
2001
Hollow Micro‐/Nanostructures: Synthesis and Applications
2008 Standout
Polymer Composite and Nanocomposite Dielectric Materials for Pulse Power Energy Storage
2009
Characteristics of n+ polycrystalline-Si/Al2O3/Si metal–oxide– semiconductor structures prepared by atomic layer chemical vapor deposition using Al(CH3)3 and H2O vapor
2001
Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates
2002
Reaction–diffusion in high-k dielectrics on Si
2003
A Continuous Process for Structurally Well-Defined Al2O3 Nanotubes Based on Pulse Anodization of Aluminum
2008
Structural and electrical characterization of Al2O3/HfO2/Al2O3 on strained SiGe
2004
Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials
2004
High temperature stability in lanthanum and zirconia-based gate dielectrics
2001
Crystallization behavior of thin ALD-Al2O3 films
2003
The restaurant at the end of the random walk: recent developments in the description of anomalous transport by fractional dynamics
2004 Standout
Effects of Various Oxidizers on the ZrO2 Thin Films Deposited by Atomic Layer Deposition
2004
Local transport and trapping issues in Al2O3 gate oxide structures
2000
Surface treatment for high-quality Al2O3 and HfO2 layers deposited on HF-dipped surface by atomic layer deposition
2003
Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon
2003
Metal–Oxide RRAM
2012 Standout
Atomic layer deposition of Al2O3 films using AlCl3 and Al(OiPr)3 as precursors
2002
Development of Dielectric Properties of Niobium Oxide, Tantalum Oxide, and Aluminum Oxide Based Nanolayered Materials
2001
Characterization of HfO2/Si(0 0 1) interface with high-resolution Rutherford backscattering spectroscopy
2004
Material and process limits in silicon VLSI technology
2001
Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water
2004
Radiation Effects in MOS Oxides
2008 Standout
Imaging the Photoionization of Individual CdSe/CdS Core−Shell Nanocrystals on n- and p-Type Silicon Substrates with Thin Oxides
2004 StandoutNobel
Atomic layer deposition (ALD): from precursors to thin film structures
2002
Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties
2002
An electron paramagnetic resonance study of the Si(100)/Al2O3 interface defects
2002
Perovskite lead-free dielectrics for energy storage applications
2018 Standout
High-κ gate dielectrics: Current status and materials properties considerations
2001 Standout
Atomic layer deposition of HfO2 thin films and nanolayered HfO2–Al2O3–Nb2O5 dielectrics
2003
Atomic Layer Deposition of Zirconium Titanium Oxide from Titanium Isopropoxide and Zirconium Chloride
2001
High Performance Multilayer MoS2 Transistors with Scandium Contacts
2012 Standout
Porous Anodic Aluminum Oxide: Anodization and Templated Synthesis of Functional Nanostructures
2014 Standout

Works of C. Krug being referenced

Atomic Transport and Chemical Stability during Annealing of UltrathinAl2O3Films on Si
2000
High-resolution depth profiling in ultrathin Al/sub 2/O/sub 3/ films on Si
2000
Electrical characteristics and interface structure of HfAlO∕SiON∕Si(001) stacks
2007
Stabilization of higher-κ tetragonal HfO2 by SiO2 admixture enabling thermally stable metal-insulator-metal capacitors
2007
High-resolution depth profiling in ultrathin Al2O3 films on Si
2000
Spectroscopic characterization of high k dielectrics: Applications to interface electronic structure and stability against chemical phase separation
2004
Ion beam studies of high-k ultrathin films deposited on Si
2002
Kruget al.Reply:
2001
Improved Ge Surface Passivation With Ultrathin $ \hbox{SiO}_{X}$ Enabling High-Mobility Surface Channel pMOSFETs Featuring a HfSiO/WN Gate Stack
2007
Ultrathin silicon oxynitride film formation by plasma immersion nitrogen implantation
1999
Isotopic substitution of Si during thermal growth of ultrathin silicon-oxide films on Si(111) inO2
1999
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