Boris Veith

Sensitization of silicon by singlet exciton fission in tetracene

High-efficiency crystalline silicon solar cells: status and perspectives

A review of Ga2O3 materials, processing, and devices

Thermal stability of Mg₂Si_0.4Sn_0.6 in inert gases and atomic-layer-deposited Al₂O₃ thin film as a protective coating

Enhancing photocatalytic CO2 reduction by coating an ultrathin Al2O3 layer on oxygen deficient TiO2 nanorods through atomic layer deposition

Improved quantitative description of Auger recombination in crystalline silicon

Engineering heterogeneous semiconductors for solar water splitting

Impurity-Related Limitations of Next-Generation Industrial Silicon Solar Cells

Silicon heterojunction solar cell with interdigitated back contacts for a photoconversion efficiency over 26%

Cocatalysts for Selective Photoreduction of CO₂into Solar Fuels

Dielectric surface passivation for silicon solar cells: A review

Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge

Long-term durable silicon photocathode protected by a thin Al2O3/SiOx layer for photoelectrochemical hydrogen evolution

High Tolerance to Iron Contamination in Lead Halide Perovskite Solar Cells

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

Advances in the Surface Passivation of Silicon Solar Cells

High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells

Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passiviation of silicon

Electronic and chemical properties of the c-Si/Al2O3 interface

Effective surface passivation of crystalline silicon using ultrathin Al₂O₃ films and Al₂O₃/SiN_x stacks

Thermal stability of silicon surface passivation by APCVD Al2O3

Comparison of ICP-AlOx and ALD-Al2O3 Layers for the Rear Surface Passivation of C-Si Solar Cells

Contact passivation in silicon solar cells using atomic‐layer‐deposited aluminum oxide layers

Very low surface recombination velocities on p- and n-type c-Si by ultrafast spatial atomic layer deposition of aluminum oxide