Standout Papers

Electron beam lithography: resolution limits and applications 2000 2026 2008 2017 770
  1. Electron beam lithography: resolution limits and applications (2000)
    Christophe Vieu, F. Carcenac et al. Applied Surface Science

Citation Impact

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Works of A. Lebib being referenced

Flux Closure Structures in Cobalt Rings
2001
Tri-layer systems for nanoimprint lithography with an improved process latitude
2000
Electron beam lithography: resolution limits and applications
2000 Standout
Nanoimprint lithography for a large area pattern replication
1999
Magnetic nanostructure fabrication by soft lithography and vortex-single domain transition in Co dots
2002
Nanoimprint fabrication of micro-rings for magnetization reversal studies
2001
Control of the critical dimension with a trilayer nanoimprint lithography procedure
2001
Versatile patterning process for semiconductorsbased on microcontact printing
1999
Size and thickness dependencies of magnetization reversal in Co dot arrays
2001
Organic thin-film transistors fabricated by microcontact printing
2004
Room-temperature and low-pressure nanoimprint lithography
2002
Microcontact printing and pattern transfer with a tri-layer processing
2000
In-plane reversal mechanisms in circular Co dots
2002
Nanoimprint and micro-contact printing tri-layer processes
2000
Rankless by CCL
2026